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TOKYO – Nikon Corporation (Nikon) will begin accepting orders for Gen 8 plate (2,290 mm × 2,620 mm) FPD lithography systems FX-88SL and FX-88SLD^*1 in November 2025. These are the first FPD lithography systems that employ a UV-LED (ultraviolet LED) light source^*2, reducing environmental impact while also providing high resolution and productivity.

• *1The FX-88SL and FX-88SLD are equipped with UV-LED light sources that differ in wavelength. For details, see “Key Performance.”
• *2Among FPD lithography systems released as of October 23, 2025, according to Nikon’s survey.

Product Name and Time Schedule

Development Background

As the demand for high-definition panels continues to grow, from smart devices to large high-end monitors, there is an increasing need to achieve both high productivity and reduced power consumption in panel manufacturing. In response to this trend, Nikon has proactively developed FPD lithography systems that employ a UV-LED light source. The UV-LED light source enables high productivity, saves energy, and reduces running costs with their high illumination power. Additionally, it contributes to environmental impact reduction by being mercury-free. Through such efforts, Nikon will continue to promote the realization of a sustainable society, as well as ongoing growth as a company, by promoting the reduction of environmental impact and other initiatives.

Key Features

1. Combination of high resolution and high productivity

The FX-88SL and FX-88SLD can expose the Gen 8 plate in 4-scan while providing excellent C.D.(Critical dimension) uniformity over the entire surface of the plate by using a high-accuracy focus correction system. The FX-88SL, equipped with a UV-LED light source equivalent to i-line, has achieved a resolution of 1.5 µm^*3 L/S^*4. The takt time is 39 seconds per plate, a 17% improvement over the conventional FX-88S^*5. The FX-88SLD, equipped with a UV-LED light source with two wavelengths^*6, further improves productivity in manufacturing processes that require high illumination power.

• *31 µm (micrometer) is one-millionth of a meter (one-thousandth of a millimeter).
• *4Abbreviation for Line and Space. Refers to the width of the wiring and the space between adjacent wiring.
• *5Conditions: 2,290 mm × 2,620 mm, 4-scan, i-line, 30 mJ/cm²
• *6Equivalent to i-line and h-line

2. Realization of overlay accuracy of ±0.3 µm

An overlay accuracy of ±0.3 µm has been achieved through high-accuracy alignment technology. By Nikon’s proprietary multi-lens system^*7, each individual lens can be controlled precisely. This technology is effective in correcting deformations in large plates, enabling highly accurate overlay. As a result, it contributes to high-yield mass production.

• *7Nikon’s proprietary technology for FPD lithography systems arranges multiple projection lenses in an array and precisely controls them to achieve the same effect as using a single giant lens. This enables patterning over a wider area in a single scan.

3. Employment of a UV-LED light source to pursue performance and environmental impact reduction

UV-LED, which features low power consumption and is mercury-free, is employed as the light source. Its high level of illumination power not only improves productivity but also reduces running costs. In addition, Nikon has established a recycling scheme for UV-LED light source components, advancing toward the realization of a sustainable society.

Key Performance

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